Fresnel Zone Plates (FZP) are to date very successful focusing optics forX-rays. Established methods of fabrication are rather complex and based onelectron beam lithography (EBL). Here, we show that ion beam lithography (IBL)may advantageously simplify their preparation. A FZP operable from the extremeUV to the limit of the hard X-ray was prepared and tested from 450 eV to 1500eV. The trapezoidal profile of the FZP favorably activates its 2nd order focus.The FZP with an outermost zone width of 100 nm allows the visualization offeatures down to 61, 31 and 21 nm in the 1st, 2nd and 3rd order focusrespectively. Measured efficiencies in the 1st and 2nd order of diffractionreach the theoretical predictions.
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